This resulted within a reduced do the job purpose plus the development of a Schottky Get hold of concerning the BrGO and n-sort Si substrate. As a consequence of the upper proportion of B-C and B-C3 bonding in the BrGO/Si machine than that during the rGO/Si, the lowered Schottky barrier https://www.directivepublications.org/journal-of-applied-nanoscience/